(浙江工業(yè)大學(xué) 材料科學(xué)與工程學(xué)院，杭州 310032)
摘 要: 采用磁控濺射法交替濺射WS2和石墨靶制備周期為4~23 nm的WSx/a-C納米多層膜。采用掃描電鏡(SEM)、能譜儀(EDS)、X射線衍射儀(XRD)和X射線光電子譜(XPS)等分析薄膜的組織結(jié)構(gòu)和元素的化學(xué)價(jià)態(tài)；采用納米壓痕儀、涂層附著力劃痕儀和球盤式摩擦磨損試驗(yàn)機(jī)測試薄膜的硬度、結(jié)合力和在潮濕大氣下(相對濕度70%)的摩擦磨損特性。結(jié)果表明：多層膜結(jié)構(gòu)致密，表面平整。a-C的加入改變WS2的結(jié)晶狀態(tài)，多層膜為微晶或非晶結(jié)構(gòu)；隨著調(diào)制周期的增大，多層膜的硫與鎢摩爾比逐漸降低并趨于穩(wěn)定(約為1.32)，其硬度稍有上升，而結(jié)合力明顯降低，摩擦因數(shù)由0.32降至0.26，而磨損率逐漸上升但顯著低于純WSx膜的。調(diào)制周期為4 nm的多層膜的耐磨性能最佳，磨損率約為1.03×10-13 m3？N-1？m-1。
關(guān)鍵字: 二硫化鎢；多層膜；調(diào)制周期；組織結(jié)構(gòu)；摩擦；磨損
（College of Materials Science and Engineering, Zhejiang University of Technology, Hangzhou 310032, China）
Abstract:WSx/a-C nanometer multilayer films with modulation period of 4-23 nm were deposited by magnetron sputtering graphite target and WS2 target alternately. The microstructures of the films and the chemical valence state of the elements were analyzed by scanning electron microscopy (SEM), energy disperse spectroscopy (EDS), X-ray diffractometry (XRD) and X-ray photoelectron spectroscopy (XPS). The hardness, adhesion to the substrate and tribological behavior of the films under humid air (RH 70%) were investigated by nano-indenter test, scratch test and ball-on-disk tribometer. The results show that the multilayer films have compact microstructure and smooth surface. The addition of a-C (amorphous carbon) layer to the films leads to the crystallinity change of WS2 phase, the multilayer films are amorphous structure. With the increase of the modulation period, the mole ratio of S to W of the films decreases to a constant value of about 1.32, the hardness increases slowly while the adhesion decreases apparently. The friction coefficient of the films decreases from 0.32 to 0.26, and the wear rate increases, but it is remarkably lower than that of WSx film. The film with modulation period of 4 nm shows the best wear resistance, and the wear rate is 1.03×10-13 m3？N-1？m-1.
Key words: WS2; multilayer films; modulation period; microstructure; friction; wear
