(廊坊師范學(xué)院 化學(xué)與材料科學(xué)學(xué)院，廊坊 065000)
摘 要: 采用電化學(xué)方法制備Ag3PO4/Ni薄膜，以掃描電鏡(SEM)、X射線衍射(XRD)和紫外-可見漫反射光譜(UV-Vis DRS)對薄膜的表面形貌、晶相結(jié)構(gòu)、光譜特性及能帶結(jié)構(gòu)進(jìn)行表征，以羅丹明B為模擬污染物對薄膜的光電催化活性和穩(wěn)定性進(jìn)行測定，采用向溶液中加入活性物種捕獲劑和通氮除氧方法對薄膜的光催化降解機(jī)理進(jìn)行探索，并提出光電催化降解羅丹明B的反應(yīng)機(jī)理。結(jié)果表明：最佳工藝下制備的Ag3PO4/Ni薄膜具有致密的層狀表面結(jié)構(gòu)，是由多晶納米顆粒構(gòu)成的薄膜。該薄膜具有顯著的光電催化活性，在最佳陽極偏壓下，光電催化羅丹明B的降解率是多孔P25 TiO2/ITO薄膜的6.69倍；相對于未加偏壓的光催化，降解率提高了5.34倍，并且具有突出的光電協(xié)同效應(yīng)。同時(shí)，該薄膜具有優(yōu)異的光催化和光電催化穩(wěn)定性。在0.1 V陽極偏壓下，可使光催化穩(wěn)定性提高近一倍。
關(guān)鍵字: Ag3PO4/Ni薄膜；陽極偏壓；光電催化；羅丹明B；反應(yīng)機(jī)理
（Faculty of Chemistry and Material Science, Langfang Teachers College, Langfang 065000, China）
Abstract:Ag3PO4/Ni thin films were prepared by electrochemical method. The surface morphology, phase structure, optical characteristics and band structure of the thin film were analyzed by scanning electron microscopy (SEM), X-ray diffraction (XRD) and ultraviolet-visible diffuse reflectance spectroscopy (UV-Vis DRS), respectively. The photoelectrocatalytic properties and stability of this coating were evaluated with rhodamine B(RhB) as a model compound. Through adding active species scavenger and removing oxygen with nitrogen to the solution, the mechanism of photoelectrocatalytic degradation of the film was explored. The mechanisms of photoeletrocatalytic reaction on the film for RhB under visible irradiation were inputted. The results show that, under optimum conditions, the Ag3PO4/Ni thin film prepared is composed of nano particles and it has dense and layered surface structure. The film has high photoelectrocatalytic activity. At optimum anodic bias, the photoeletrocatalytic degradation rate of Ag3PO4/Ni thin film is 6.69 times as that of porous P25 TiO2 /ITO nanofilm. Compared the coating without anodic bias, the photoeletrocatalytic degradation rate for the Ag3PO4/Ni thin film to RhB increases by 5.34 times and the thin film has obvious photoelectric synergistic effect. Especially, the film has excellent photocatalytic and photoelectrocatalytic stability. At 0.1 V anodic bias, its photoeletrocatalytic stability increases by about one time than its photocatalytic stability without anodic bias.
Key words: Ag3PO4/Ni thin film; anodic bias; photoelectrocatalysis; rhodamine B; reaction mechanism
