(1. 北京理工大學 材料學院，北京 100081；
2. 中國航天員科研與訓練中心，北京 100081)
摘 要: 以WF6為前驅體，采用化學氣相沉積法(CVD)在純銅基體上沉積出鎢涂層。利用光學顯微鏡(OM)和掃描電鏡(SEM)分析研究鎢制品組織缺陷的形成。結果表明：反應物濃度起伏對化學氣相沉積鎢的顯微組織具有顯著影響。當n(WF6):n(H2)≥1:3時，沉積物為柱狀晶組織；當n(WF6):n(H2)＜1:3時，該沉積層晶粒明顯細化，顯微組織為細晶層狀結構。另外，沉積過程中雜質形狀也顯著影響沉積層的顯微組織。當基體表面存在一維雜質時，沉積制品表面產(chǎn)生明顯的凸起，嚴重影響制品的表面質量和顯微組織的均勻性；當沉積過程中存在零維雜質時，沉積層出現(xiàn)放射狀的組織結構。
關鍵字: WF6；鎢；化學氣相沉積；反應物濃度起伏；雜質形狀；組織缺陷
（1. School of Material Science and Engineering, Beijing Institute of Technology, Beijing 100081, China;
2. China Astronaut Research and Training Center, Beijing 100081, China）
Abstract:Tungsten coatings were deposited on pure copper substrates using WF6 as the precursor by chemical vapor deposition (CVD) method. The formation of the microstructure defects of the tungsten deposits was analyzed by OM and SEM. The results show that the reactant concentration fluctuation has a significant impact on the microstructure of tungsten prepared by CVD method. When n(WF6):n(H2)≥1:3, the microstructure of tungsten is columnar grain; when n(WF6):n(H2)＜1:3, the grains of the deposited layer are refined and the microstructure presents a fine grains multilayer structure. Moreover, the shapes of the impurities can also influence significantly on microstructure of the layer. When there is one-dimensional impurity on the surface of substrate, the surface of deposition has obvious bulge, which seriously affects the deposits surface quality and microstructure uniformity; when there is zero dimensional impurity during the deposition process, the deposit appears radial structure.
Key words: WF6; tungsten; chemical vapor deposition; reactant concentration fluctuation; impurity shape; microstructure defect
