(北京工業(yè)大學(xué) 材料科學(xué)與工程學(xué)院，北京 100124)
摘 要: 以CH4和H2為反應(yīng)氣，采用微波等離子體增強化學(xué)氣相沉積方法在直徑為10 cm的硅原片上制備納米金剛石薄膜。用X射線衍射儀、拉曼光譜、掃描電鏡和原子力顯微鏡對薄膜的組成結(jié)構(gòu)及性能進行表征。結(jié)果表明：薄膜的平均晶粒尺寸約為13.8 nm，厚度可達10.8 μm，表面粗糙度約為11.8 nm；其拉曼光譜是典型的納米金剛石薄膜的特征峰峰形，同時在高真空條件下對所制備的薄膜樣品進行場發(fā)射性能測試。
關(guān)鍵字: 納米金剛石薄膜；拉曼圖譜；表面粗糙度；場發(fā)射性能
（College of Materials Science and Engineering, Beijing University of Technology, Beijing 100124, China）
Abstract:Nanocrystalline diamond (NCD) films were synthesized on the silicon substrate with diameter of 10 cm by microwave plasma enhanced chemical vapour deposition using CH4 and H2 as the reactant gas. The film composition and performance were characterized by X-ray diffractometry, Raman spectroscopy, scanning electron microscopy and atomic force microscopy, respectively. The results show that, the average grain size of the film is about 13.8 nm, the maximum thickness can reach 10.8 μm and the surface roughness is 11.8 nm. The Raman spectrum is the typical characteristic peak shape of nanocrystalline diamond films, and the field emission properties were measured under high vacuum conditions.
Key words: nanocrystalline diamond film; Raman spectrum; surface roughness; field emission property
