(1. 上海理工大學(xué) 機(jī)械工程學(xué)院，上海 200093；
2. 上海理工大學(xué) 材料科學(xué)與工程學(xué)院，上海 200093)
摘 要: 采用不同Si含量的TiSi復(fù)合靶和Cr靶，用射頻磁控濺射工藝在Si基底片上沉積不同Si含量的CrN/TiSiN納米多層膜。采用X射線衍射儀(XRD)、高分辨透射電子顯微鏡(HRTEM)和納米壓痕儀研究Si含量對CrN/TiSiN納米多層膜顯微結(jié)構(gòu)和力學(xué)性能的影響。結(jié)果表明：隨著Si含量的增加，CrN相的結(jié)晶程度先增加后降低，涂層的力學(xué)性能先提高后降低，當(dāng)n(Si):n(Ti)=7:18時(shí)獲得最高硬度為31.5GPa。HRTEM觀測表明，在n(Si):n(Ti)=7:18時(shí)，TiSiN層在CrN層的模板作用下呈面心立方結(jié)構(gòu)，并且與CrN層形成共格外延生長結(jié)構(gòu)；當(dāng)n(Si):n(Ti)=11:14時(shí)，TiSiN層總體呈非晶結(jié)構(gòu)，與CrN層的共格外生長結(jié)構(gòu)被破壞。硬度的升高主要與TiSiN與CrN形成共格外延生長結(jié)構(gòu)有關(guān)。
關(guān)鍵字: CrN/TiSiN納米多層膜；Si含量；顯微結(jié)構(gòu)；力學(xué)性能；外延生長
（1. School of Mechanical Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China;
2. School of Materials Science and Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China）
Abstract:Using Cr and TiSi targets with different Si contents, a series of CrN/TiSiN nanomultilayered films with different Si contents were deposited on the Si substrate by means of radio frequency (RF) magnetron sputtering method. By X-ray diffractometry (XRD), high resolution transmission electron microscopy (HRTEM) and nano-indentation techniques, the influences of Si content on microstructure and mechanical properties of CrN/TiSiN nanomultilayered films were investigated. The results show that, with the increase of Si content, the crystallinity of CrN/TiSiN nanomultilayered film firstly increases and then decreases, the mechanical properties firstly improve and then worsen. When the ratio of n(Si) to n(Ti) is 7:18, the maximum hardness of 31.5 GPa can be obtained. The HRTEM observations show that, when the ratio of n(Si) to n(Ti) is 7:18, TiSiN layers exhibit face-centered cubic structure under the template effect of CrN layers and grow epitaxially with CrN layers. As the ratio of n(Si) to n(Ti) increases to 11:14, TiSiN layers generally present amorphous structure, resulting in the destruction of the coherent growth between CrN and TiSiN layers. The improvement of hardness can be attributed to the coherent growth structure within CrN/TiSiN nanomultilayered films.
Key words: CrN/TiSiN nanomultilayered film; Si content; microstructure; mechanical properties; epitaxial growth
