(1. 西南交通大學 超導與新能源研究開發(fā)中心 材料先進技術教育部重點實驗室，成都 610031；
2. 北京大學 物理系，北京 100871；3. 新南威爾士大學 材料科學與工程學院，澳大利亞 悉尼 2052)
摘 要: 采用高分子輔助的化學溶液沉積法，通過720~800 ℃之間進行燒結成相，分別在氬氣和空氣中SrTiO3 (STO)單晶基底上沉積得到織構良好的SrZrO3 (SZO)外延薄膜，重點研究不同熱處理氣氛對SZO薄膜織構和表面微結 構的影響。結果表明：氬氣中制得的SZO外延薄膜c軸取向較好，且表面更加平整致密；氬氣中770 ℃制備的SZO薄膜厚度超過230 nm。而空氣中制得的SZO薄膜表面呈現(xiàn)局部團聚和開裂。在氬氣中采用高分子輔助的化學溶液沉積法有利于制備出低成本、高性能的涂層導體用單一SZO緩沖層。
關鍵字: 涂層導體；SrZrO3緩沖層；化學溶液沉積法；織構
（1. Key Laboratory of Magnetic Levitation Technologies and Maglev Trains, Ministry of Education,
Southwest Jiaotong University, Chengdu 610031, China;
2. Department of Physics, Peking Univer）
Abstract:The highly epitaxial SrZrO3 (SZO) buffer layer was deposited on SrTiO3 single crystal substrate both in Ar and in air by a polymer-assisted chemical solution deposition method at a temperature window of 720?800 ℃, which is a temperature range suitable for mass preparation of coated conductors. The effects of different atmosphere on the quality of final SZO were investigated. The results show that SZO buffer layers yielded in argon displays a smooth and crack-free surface and a good in-plan and out-plan orientation. Especially, the thickness is beyond 230 nm. However, the agglomeration and cracks begin to appear when the SZO buffer layers are fabricated in air. Using polymer-assisted chemical solution deposition method and fabricating in argon may be a effective measure to obtain the thick and high quality single SZO buffer layers.
Key words: coated conductor; SrZrO3 buffer layer; chemical solution deposition; texture
