(河南大學(xué) 特種功能材料重點實驗室，開封 475004)
摘 要: 采用離子束濺射與磁過濾陰極弧共沉積技術(shù)在單晶硅片(400)表面制備Si含量(摩爾分?jǐn)?shù))為3.2%~15.5%范圍內(nèi)的TiSiN薄膜。采用X射線光電子能譜(XPS)、電子散射譜(EDS)、X射線衍射儀(XRD)研究TiSiN薄膜的顯微結(jié)構(gòu)和力學(xué)性能。結(jié)果表明：低Si含量的薄膜以面心立方晶型的Ti(Si)N固溶體形式存在，擇優(yōu)晶面為(200)面；當(dāng)Si含量飽和后，出現(xiàn)Ti(Si)N和Si3N4非晶相，形成Ti(Si)N/Si3N4納米復(fù)合結(jié)構(gòu)。薄膜硬度范圍在22~26 GPa，采用Si3N4小球為對偶時薄膜的摩擦因數(shù)均維持在0.13~0.17之間。Si含量為10.9%時，硬度達(dá)最大值，結(jié)合較低的粗糙度，使其摩擦因數(shù)和磨損率達(dá)到最低值。
關(guān)鍵字: Ti-Si-N；納米復(fù)合薄膜；納米硬度；摩擦
（Laboratory of Special Functional Materials, Henan University, Kaifeng 475004, China）
Abstract:Ti-Si-N films containing 3.2%−15.5% Si (molar fraction) were deposited on Si(400) substrates by ion beam sputtering combined with filted cathodic arc system. X-ray photoelectron spectroscopy (XPS), energy dispersive spectroscopy (EDS) and X-ray diffractometry (XRD) were used to study the microstructure and mechanical properties of TiSiN films. The results suggest that a Ti(Si)N solid solution with face-centered cubic structure and (200) preferred crystalline orientation exist in the films with lower Si content. After saturation of Si, the films form a two-phase structure, consisting of Ti(Si)N and amorphous Si3N4. The hardness of films is in the range from 22 GPa to 26 GPa. The friction coefficients maintain at 0.13−0.17 using Si3N4 spheres as couples. The hardness of film with 10.9% Si reaches the maximum value, combined with lower roughness, which results that the friction coefficient and wear rate reaches the minimum value.
Key words: Ti-Si-N; nancomposite film; nanohardness; tribology
