(1.北京科技大學(xué)化學(xué)系， 北京 100083;
2.北京航空航天大學(xué)材料科學(xué)系，北京 100083)
摘 要: XPS電子能譜技術(shù)的測(cè)定表明，化學(xué)鍍誘發(fā)伊始，先只有鎳的沉積， 然后才有Ni-P的共沉積出現(xiàn)。結(jié)合銅基試樣在所設(shè)計(jì)的4種溶液體系中動(dòng)電位掃描伏安曲線的結(jié)果，初步顯示，對(duì)化學(xué)鍍鎳具有催化特性的金屬，從電化學(xué)本質(zhì)上來(lái)說(shuō)，就是一種自身能提供到達(dá)或超過(guò)鎳的析出電位的金屬。 通過(guò)電極電位的理論計(jì)算及混合電位的測(cè)定，說(shuō)明了化學(xué)鍍鎳首先是鎳析出， 然后再發(fā)生Ni-P共沉的機(jī)理。
關(guān)鍵字: 化學(xué)鍍鎳 誘發(fā)過(guò)程 催化活性
（1.Department of Chemistry,University of Science and Technology Beijing, Beijing 100083, P. R. China;
2.University of Aeronautics and Astronautics Beijing, Beijing 100083, P. R. China）
Abstract:The XPS experimental results of the authors' study indicate d that the Ni deposits first, then the Ni-P co-deposits at the beginning of electroless nickel plating process induced on the Cu substrate. Combined with the electrochemical behaviours of Cu substrate in the four intentionally designed solution systems investigated by linear sweep voltammetry, it was tentatively shown that a metal with the catalytical characteristic for electroless nickel plating is the metal whose potential in the electroless plating bath can reach or surpass the potential of Ni deposition. In addition, based on the calculation of electrical potentials and the measurement of mixed potentials, it has also been proved that the deposition of nickel happens first, then the co-deposition of Ni-P is followed.
Key words: electroless nickel plating induction process catalytic activity
