(中南工業(yè)大學(xué)冶金物理化學(xué)和化學(xué)新材料研究所， 長沙 410083)
摘 要: 報導(dǎo)了一種Cr3+水溶液中電鍍非晶態(tài)鉻新工藝。采用由適當(dāng)?shù)慕j(luò)合劑、穩(wěn)定劑、添加劑以及Cr3+鹽組成的電鍍液，于室溫下電沉積出厚度達(dá)11 μm、外觀接近鏡面的非晶態(tài)鉻鍍層。實驗發(fā)現(xiàn)，藍(lán)膜的生成是光亮非晶態(tài)Cr層得以電沉積出來的首要條件。采用X射線衍射和掃描電子顯微鏡等方法對鉻鍍層的結(jié)構(gòu)進(jìn)行了分析。結(jié)果表明，鉻鍍層的X射線衍射圖中只有非晶態(tài)鉻的寬化峰；掃描電子顯微鏡結(jié)果顯示所得Cr鍍層沒有針孔，只有少數(shù)細(xì)小的裂紋。對Cr3+水溶液中電鍍Cr的工藝條件和絡(luò)合劑、穩(wěn)定劑、添加劑的作用進(jìn)行了探討。
關(guān)鍵字: 三價鉻電鍍；非晶態(tài)； 添加劑
（Institute of Metallurgical Physicochemistry and New Chemical Materials,
Central South University of Technology, Changsha 410083, P.R.China）
Abstract:A new formula containing complexing agents, stabilizer and additives was reported for the electrodeposition of amorphous chromium in Cr(Ⅲ) aqueous solution. At room temperature, up to 11 μm thick deposit was obtained with a mirror like appearance. A blue film was found on the substrate before the commence of chromium deposition and is thought to be a prerequisite for the deposition of bright amorphous chromium. X-ray diffraction (XRD) and scanning electron microscope (SEM) were used to characterize the properties of the chromium deposits. XRD exhibited only broad humps for amorphous chromium and SEM showed that the deposit contains only a few fine cracks but no pinholes. The operation parameters and the roles of the complexing agents, stabilizer and additives were briefly discussed.
Key words: Chromium(Ⅲ) electroplating; amorphous state; additives
