(1. 四川大學化工機械系； 2. 金材系，成都610065)
摘 要: 研究了在HCl溶液中50Hz交流電侵蝕下電流密度對電解電容器用高純鋁箔的腐蝕行為的影響。結(jié)果表明，侵蝕初期的真實電流密度決定鋁箔蝕孔的尺寸和表面膜，大電流在鋁箔表面產(chǎn)生厚膜，阻礙交流電侵蝕的陰、陽極反應過程和蝕孔深入。隨著電流密度減小，試樣的蝕孔孔徑增大，在<0.2 A/cm2電流下的蝕孔比其它大電流下的蝕孔孔徑大4倍左右。先用<0.2 A/cm2的小電流侵蝕，再用0.2～0.5A/cm2大電流侵蝕組合，鋁箔電容量隨電量的增加直線上升。用50 Hz交流電可以使鋁箔獲得良好的起始發(fā)孔，得到具有較大孔徑和多向堆壘型海綿層蝕孔的大容量電解電容器用鋁箔。
關(guān)鍵字: 鋁箔；侵蝕；孔蝕
（Department of Chemical Engineering Machinery, Sichuan University, Chengdu 610065, P.R.China）
Abstract:Aluminum foil for low voltage aluminum electrolytic capacitors was etched by different current density of 50 Hz AC in hot choleric solution. The results showed that the current density of AC has definite effect on the initial pit growth size and etch film of pits in etched Al foil. Using AC 0.3～0.5 A/cm2, the potential peak-peak value of E-t was about 2.4 V and the break down potential E p was about 1.0 V, but using AC<0.2A/cm2 , the potential peak-peak value was only 0.7V and the Ep was only 0.4 V. It was showed that the thicker etch film was formed by bigger current. The size of cubic pits in AC<0.2A/cm2 was 4 times larger than that in other bigger AC current density. Etching combined current density may get etch pit of bigger aperture and etch aluminum foil of bigger capacitance, first step using AC<0.2A/cm2, and second step using AC 0.2～0.5A/cm2，the larger area and capacitance of etched aluminum foil can be obtained by 50Hz AC.
Key words: aluminum foils; etching; pitting
