(西安交通大學(xué)金屬材料強度國家重點實驗室， 西安 710049)
摘 要: 利用離子束增強沉積(IBED)技術(shù)制備了CrNx薄膜。 對不同能量氮離子轟擊所制備的薄膜進行了X射線衍射、 X射線光電子能譜分析、 膜層斷裂韌性以及摩擦學(xué)性能研究。 試驗結(jié)果表明， 在相同試驗條件下， 氮離子轟擊能量影響CrNx薄膜的相組成及取向， 低能氮離子轟擊所制薄膜具有較高的KIC數(shù)值， 且表現(xiàn)出更優(yōu)異的摩擦學(xué)性能。
關(guān)鍵字: 離子束增強沉積(IBED) 薄膜 CrNx 摩擦磨損
（State Key Laboratory for Mechanical Behaviour of Materials,Xi'an Jiaotong University, Xi'an 710049, P. R. China
）
Abstract:CrNx films were synthesized with 4, 8 and 12 keV nitrogen ion of dose of 3.38×1013 cm-2·s-1 by IBED. The structure of the films was characterized by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), wheras the wear and tear properties of the films were investigated on a block-on-ring tester. Results indicate that the phases and orientation of CrNx are affected obviously by nitrogen ion bombarding energy, and films with lower energy have better tribological property and higher fracture toughness, especially for 4keV.
Key words: IBED film CrNx wear and tear
