(1. 北京科技大學 物理化學系，北京100083；2. 江西省科學院應用物理研究所，南昌330029)
摘 要: 對鉭表面滲氮的固-氣界面反應過程進行了熱力學和動力學分析，從理論上預測了各種參數(shù)(壓力、氣體組成、溫度、電參數(shù)等)對表面過程的影響，并借助于等離子體，在較低溫度下獲得了由表面層與N在Ta中的固溶體組成的表面硬化層。表面層為六方晶系的Ta6N2.57和/或非晶態(tài)。通過調整工藝參數(shù)有效地抑制了鉭表面氧的滲入和Ta2O5的形成，使得離子滲氮后，仍保持較低的表面粗糙度。
關鍵字: 鉭；離子滲氮；表面過程
L IN Qin1
（1. Department of Physical Chemistry, University of Science and Technology of Beijing, Beijing 100083, P.R.China;
2. Institute of Applied Physics, Jiangxi Academy of Sciences, Nanchang 330029, P.R.China）
Abstract:The reaction process on the surface of solid-gases during nitriding of tantalum was discussed thermodynamically and dynamically. The effects of technical parameters such as pressure, temperature, electrical current density and voltage on the surface process were analyzed theoretically. The nitriding layers on tantalum surfaces with high hardness and better roughness were obtained with the help of plasma at low temperature. The layers were composed of the solid solution of tantalum and surface layers, which are amorphous phase or/and compound Ta6N2.57.
Key words: tantalum; ion-nitriding; surface process
