(1. 太原理工大學(xué) 表面工程研究所， 太原 030024；
2.西安交通大學(xué) 材料科學(xué)與工程學(xué)院，西安 710074)
摘 要: 介紹了一種新型的在鋼鐵基體上制備鉭薄膜的方法。該方法用網(wǎng)狀鉭片作陰極，它既是放電氣體的離解源，又是沉積鉭膜的鉭離子供給源，其設(shè)備簡單、價格低廉。實驗中發(fā)現(xiàn)，在各個參數(shù)配比合適的條件下，可制備出結(jié)構(gòu)為bcc(體心立方)和tetragonal(四方晶系)的鉭薄膜。薄膜較致密且均勻，與基體的結(jié)合好。同時分析了在最佳工藝參數(shù)條件下合成鉭膜的組織結(jié)構(gòu)、表面和斷口形貌、結(jié)合力等。
關(guān)鍵字: 網(wǎng)狀陰極濺射； 空心陰極效應(yīng)；鉭薄膜
net-shape cathode sputtering method
（1. Research Institute of Surface Engineering，
Taiyuan University of Techenology，Taiyuan 030024， P.R.China；
2. School of Materials Science and Technology，
Xi′an Jiaotong University，Xi′an 710074, P.R.China）
Abstract:A new method， which synthesizes tantalum film by a net-shape sputtering cathode， has been introduced. By analyzing the structure， the surface and rapture morphology， nd the adhesion strength of synthesized Ta thin film using X-ray diffraction (XRD)， scanning electron microscope(SEM)， it was found that bcc α Ta and tetragonal β Ta film of tantalum are formed in 20 steel. Meanwhile， there is the formation of alloy layer between Ta film and steel substrate， which improves the adhesion strength of Ta film. The study manifests that the net-shape cathode sputtering device possesses many advantages and can be used for synthesizing the optimum quality film of tantalum.
Key words: net-shape cathode sputter； effect of hollow cathode； tantalum thin film
