(哈爾濱工業(yè)大學(xué)材料科學(xué)與工程學(xué)院, 哈爾濱 150001)
摘 要: 采用等離子體基離子注氧技術(shù)（O2-PBII）對(duì)Ti6Al4V合金進(jìn)行了表面改性處理， 實(shí)驗(yàn)過(guò)程中改變注入離子能量的工藝參數(shù)，負(fù)脈沖偏壓分別為10、 20、 30 kV， 離子注入過(guò)程中樣品臺(tái)通油冷卻以實(shí)現(xiàn)低溫注入； 用XPS對(duì)離子注氧層的深度、 成分及化學(xué)結(jié)構(gòu)進(jìn)行了系統(tǒng)的分析。結(jié)果表明： 隨著注入離子能量的增加， Ti6Al4V合金表面改性層的深度明顯增加，改性層的外層由一定厚度的TiO2組成，外層與內(nèi)層基體之間存在Ti2O3和TiO; Al元素在改性層的外層以氧化物形式存在，且該氧化物趨于表面生長(zhǎng)； 在表面改性層的外層未發(fā)現(xiàn)V及其氧化物。
關(guān)鍵字: 等離子體基離子注入； XPS分析； 化學(xué)態(tài)
implanted with oxygen by plasma base ion implantation
（ School of Materials Science and Engineering,
Harbin Institute of Technology, Harbin 150001, China）
Abstract: The modified layers by O2-PBII technology on Ti6Al4V alloy surface were studied using X-ray photoelectron spectroscopy (XPS). The negative pulse voltage of 10, 20, 30 kV was applied to the sample, which was mounted on an oil-cooled sample holder. The results show that the thickness of the oxide layer increases with increasing implanted ion energy. The oxide layer is predominantly TiO2, which contains a small amount of suboxides TiO and Ti2O3 between the outmost layer and metallic substrate. The XPS analysis confirms that Al2O3 is located mainly in the outer surface of the modified layers， in which vanadium and vanadium oxide are not detected.
Key words: plasma-base-ion-implantation; X-ray photoelectron spectroscopy analysis; chemical state
