(蘭州大學(xué) 等離子體與金屬材料研究所，蘭州 730000)
摘 要: 采用自行研制的磁過濾等離子體裝置在單晶Si基底上制備了優(yōu)質(zhì)類金剛石(DLC)薄膜。 運(yùn)用紅外光譜(IR)、 掃描電鏡(SEM)， 原子力顯微鏡(AFM)和納米壓痕儀對樣品進(jìn)行了表征和分析， 著重研究了襯底偏壓類型對制備薄膜的影響。 結(jié)果表明： 在無偏壓或周期性負(fù)偏壓下制備的DLC薄膜的sp3含量比連續(xù)負(fù)偏壓下制備的薄膜的sp3含量要高； 同時(shí)在周期性偏壓下制備的薄膜表面較光滑， 其表面粗糙度僅為0.1 nm， sp3含量達(dá)到66.8%， 相應(yīng)的納米硬度也較高(達(dá)到80 GPa)。 同時(shí)對相應(yīng)的成膜機(jī)理進(jìn)行了討論。
關(guān)鍵字: 周期性偏壓； 優(yōu)質(zhì)DLC膜； 磁過濾等離子體； 硬度
（ Institute of Plasma & Metal Materials, Lanzhou University, Lanzhou 730000, China）
Abstract: High quality DLC films were fabricated on the single crystal Si substrate by using filtered cathode arc plasma self-developed. IR, SEM, TEM and nano-indenter were employed to characterize the DLC films. Specially the effects of the bias types on the properties of the films were studied. The research results show that the sp3 content of the DLC films deposited under no or periodic negative bias is higher than that under the continue negative bias. At the same time, the DLC film deposited at periodic bias is of smoother surface with roughness of 0.1 nm, high sp3 content of 66.8%, and higher hardness of 80 GPa. The mechanism for depositing the DLC films was also discussed in detail.
Key words: periodic bias; high-quality DLC films; magnetic filtered plasma; hardness
