(上海交通大學(xué) 材料科學(xué)與工程學(xué)院
教育部高溫材料及測試重點(diǎn)實(shí)驗(yàn)室， 上海 200030)
摘 要: 采用磁控濺射方法制備了Cr-Si-Ni電阻薄膜， 研究了薄膜在模擬酸性(0.1 mol/L HCl)和堿性(0.1 mol/L NaOH)溶液環(huán)境中的電學(xué)穩(wěn)定性和長期使用可靠性。 結(jié)果表明： 在室溫(25 ℃)時(shí)， 500 ℃熱處理后的納米晶結(jié)構(gòu)薄膜在酸性溶液環(huán)境中比在堿性溶液環(huán)境中具有更優(yōu)異的電學(xué)穩(wěn)定性和長期使用可靠性。 在酸堿兩種溶液中浸泡240 h后， 薄膜試樣的相對電阻變化(ΔR/R)分別為0.96％和3.31％。 電化學(xué)實(shí)驗(yàn)和AES表面成分分析表明， 在酸堿兩種溶液中薄膜表面都能夠形成致密穩(wěn)定的SiO2保護(hù)層， 而且酸性環(huán)境形成的鈍化膜比堿性環(huán)境形成的鈍化膜具有更好的腐蝕保護(hù)作用。
關(guān)鍵字: 電阻薄膜； 電學(xué)穩(wěn)定性； 相對電阻變化； 腐蝕行為
acidic and alkaline aqueous solutions
（ Key Laboratory for High Temperature Materials and Tests of Ministry of Education, School of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200030, China）
Abstract: Cr-Si-Ni resistive films were prepared by magnetron sputtering. Electrical properties stability and long-term reliability of the films in 0.1 mol/L HCl and 0.1 mol/L NaOH aqueous solutions were investigated, which simulated acidic and alkaline environments. The results reveal that the nanocrystalline films by annealing at 500 ℃ in acidic environments present much more excellent electrical stability and good long-term reliability than the films in alkaline environments at 25 ℃. After immersing the films in two solutions for 240 h, the relative resistance change (ΔR/R) of the films is 0.96% and 3.31%, respectively. The electrochemical measurements and AES results indicate that the surface of the films can both form a dense and stable SiO2 protective layer in acidic and alkaline solutions, and that the passive film in acidic environments exhibits much more protective effects on the films than that in alkaline environments.
Key words: resistive films; electrical stability; relative resistance change; corrosion behavior
