(廣州有色金屬研究院 材料表面工程研究所，廣州 510651)
摘 要: 采用中頻反應磁控濺射、離子束輔助方法沉積CrTiAlCN多元硬質薄膜，利用掃描電鏡、俄歇電子譜、透射電鏡及X射線衍射等技術對膜層的過渡層、界面及微觀結構進行研究。結果表明：沉積制備的膜層為多層梯度過渡結構，成分深度分布及相結構分析證實，所制備的多元多層梯度膜與所設計的基體/Cr/CrN/CrTiAlN/ CrTiAlCN結構相吻合；在梯度過渡中，不同層之間界面體現(xiàn)為漸變過渡過程；沉積制備的多元多層梯度膜硬度高達26.31 GPa，膜/基結合力大于80 N，摩擦因數低至0.113，力學性能優(yōu)良。
關鍵字: CrTiAlCN薄膜；磁控濺射；離子束輔助
LIN Kai-sheng, KUANG Min, DAI Da-huang
（Institute of Surface Engineering, Guangzhou Research Institute of Non-ferrous Metals, Guangzhou 510651, China）
Abstract: CrTiAlN multi-composite hard films were deposited by ion beam assisted reactive mid-frequency magnetron sputtering. Auger electron spectroscopy, transmission electron microscopy, X-ray diffractometry and microhardness tester were used to investigate the interface, interlayer, microstructure and composition of the multi-composite hard films. The results show that the multi-composite hard films contain multilayer gradient structure that coincides with the designed structure of substrate/Cr/CrN/CrTiAlN/CrTiAlCN, the composition distribution changes gradually between the interface in interlayer. The hard films exhibit good comprehensive performance with micro-hardness of 26.31 GPa, adhesion strength of 80 N and friction coefficient of 0.113.
Key words: CrTiAlCN; thin films; unbalanced magnetron sputtering; ion beam assistance
