中國(guó)有色金屬學(xué)報(bào)(英文版)
Transactions of Nonferrous Metals Society of China
| Vol. 2 No. 1 February 1992 |
X-RAY STUDY ON TITANIUM NITRIDE FILMS DEPOSITED BY VCAD METHOD
Liu Xingcheng, Yuan Zhenhai, Dai Dahuan
（Guangzhou Research Institute of Nonferrous Metals, 510005,Guangzhou China）
Abstract:TiN films deposited by the VCAD method at the substrate of stainless steel and superhigh speed tool steels are uniform and dense. Their colour, orientation and lattice parameter depend on deposited condition The lattice structure of deposited film, the change of the lattice parameter and its preferred orientation were studied by the XRD method, different behaviours of TiNx film were analysed. The lattice parameter of TiNx films is increased with the nitrogen content and The colour of TiNx film is strongly related to the content of Nitrogen also. The change of preferred orientation depends mainly on the Bias.
Key words: VCAD method, TiN Film, X-ray
