中國有色金屬學(xué)報(英文版)
Transactions of Nonferrous Metals Society of China
| Vol. 7 No. 4 December 1997 |
FABRICATION OF HIGH-MELTING POINT METAL COATING
Tang Bin1; Hu Xinfang1; Xu Kewei1 Wang Congzeng2
（1.School of Materials Science and Engineering; Xi′an Jiaotong University; Xi′an 710049
2. Research Institute of Surface Engineering; Taiyuan Polytechnic University; Taiyuan 030024）
Abstract:A new multiple hollow cathode sputtering target which has a simple configuration and a high sputtering rate was developed. Parameters of discharge and coating were studied. The results indicate that the current density and sputtering rate depend on the working pressure, target voltage and configuration. When H·D-1 is 2～3, the target has an efficient sputtering rate. The optimum negative bias voltage is 200～300 V for Mo coating.
Key words: multiple hollow cathode sputtering target coating high melting point metal
